Nuclear scanning microprobe in the study of silicon carbide epilayers

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Resumo

We presented the results of the study of surfaces of homoepitaxial 4H-SiC layers using a nuclear scanning microprobe in the Rutherford backscattering mode. Analysis of the state of the sample surfaces and synthesis modes showed that an increase in the silicon (Si) content in the upper layers of some samples precedes the formation of highly defective 4H-SiC layers.

Sobre autores

M. Buzoverya

Russian Federal Nuclear Center — All-Russia Research Institute of Experimental Physics

Email: dismos51@gmail.com
Rússia, Sarov, 607188

I. Karpov

Russian Federal Nuclear Center — All-Russia Research Institute of Experimental Physics

Email: dismos51@gmail.com
Rússia, Sarov, 607188

A. Arkhipov

Russian Federal Nuclear Center — All-Russia Research Institute of Experimental Physics

Email: dismos51@gmail.com
Rússia, Sarov, 607188

D. Skvortsov

National Research Ogarev Mordovia State University

Autor responsável pela correspondência
Email: dismos51@gmail.com

Research Laboratory “Synthesis and Processing of Silicon Carbide Single Crystals”

Rússia, Saransk, 430005

V. Neverov

National Research Ogarev Mordovia State University

Email: dismos51@gmail.com

Research Laboratory “Synthesis and Processing of Silicon Carbide Single Crystals”

Rússia, Saransk, 430005

B. Mamin

National Research Ogarev Mordovia State University

Email: dismos51@gmail.com

Research Laboratory “Synthesis and Processing of Silicon Carbide Single Crystals”

Rússia, Saransk, 430005

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